Vertically Oriented Sub-10-nm Plasmonic Nanogap Arrays
نویسندگان
چکیده
منابع مشابه
Fabrication of sub-10 nm gap arrays over large areas for plasmonic sensors
We report a high-throughput method for the fabrication of metallic nanogap arrays with high-accuracy over large areas. This method, based on shadow evaporation and interference lithography, achieves sub-10 nm gap sizes with a high accuracy of 61.5 nm. Controlled fabrication is demonstrated over mm areas and for periods of 250 nm. Experiments complemented with numerical simulations indicate that...
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ژورنال
عنوان ژورنال: Nano Letters
سال: 2010
ISSN: 1530-6984,1530-6992
DOI: 10.1021/nl1012085